MANUFACTURING METHOD OF SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE THEREBY OBTAINED,申请号JP19910318808-传众专利搜索

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发明名称	MANUFACTURING METHOD OF SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE THEREBY OBTAINED
摘要
申请公布号	JPH05160144(A)	申请公布日期	1993.06.25
申请号	JP19910318808	申请日期	1991.12.03
申请人	HITACHI LTD;HITACHI VLSI ENG CORP	发明人	ARIGA SEIICHI;FUJITA ERI;HOSHINO YUTAKA;SATO KAZUE;TAKAHASHI MASATO;IZAWA RYUICHI;YOSHIZUMI KEIICHI;SUZUKI NORIO;KANDA TAKAYUKI;KURAMOTO ISAMU;YOSHIDA YASUKO;HASHIBA SOICHIRO;MORI CHIEMI;MATSUKI HIROSHI;IKEDA SHUJI
分类号	H01L21/336;H01L29/78	主分类号	H01L21/336
代理机构		代理人
主权项
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