| 发明名称 |
Method for producing CVD diamond film. |
| 摘要 |
<p>In a chemical vapor deposition method for producing a diamond film substantially free of thermal stress-induced cracks, diamond growth occurs on both sides of a thin substrate so that two diamond coatings with identical opposing tensile forces are formed on each side of the substrate at a thickness greater than the thickness of the substrate.</p> |
| 申请公布号 |
EP0546754(A1) |
申请公布日期 |
1993.06.16 |
| 申请号 |
EP19920310954 |
申请日期 |
1992.12.01 |
| 申请人 |
GENERAL ELECTRIC COMPANY |
发明人 |
SLUTZ, DAVID EARL;KNEMEYR, FRIEDEL SIEGFRIED |
| 分类号 |
B01J19/00;C23C16/01;C23C16/26;C23C16/27;C30B25/02;C30B25/18;C30B29/04;H01L21/205 |
主分类号 |
B01J19/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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