| 摘要 |
<p>PURPOSE:To obtain the photomask which can obtain a high-contrast image with a fine pattern. CONSTITUTION:Light shield films 12 formed of chromium, etc., are provided at specific pitch on the reverse surface of a transparent substrate 11 to form a line-and-space pattern where light transmission parts (substrate bare part) and light shield parts are alternated. A polarizing film 13 which transmits only light whose electric vector vibrates in parallel to the sides of the pattern (perpendicularly to paper surface) is provided on (or beneath) the transparent substrate 11 is provided over the entire line-and-space pattern. A phase shift film may be added in addition to the polarizing film 13. When this photomask is used, an image is formed with TE polarized light whose electric vector vibration direction is uniformly perpendicular to an incident plane is formed to increase the contrast of the image.</p> |
