发明名称 Method and apparatus for back side damage of silicon wafers
摘要 A method of backside damaging a silicon semiconductor wafer by abrading the wafer in an abrasive powder is disclosed. The wafer is rotated or translated in the powder while the powder is being vibrated. A fixture holds one or more semiconductor wafers during the processing and allows the wafer to be rotated during processing if desired.
申请公布号 US5197271(A) 申请公布日期 1993.03.30
申请号 US19810674822 申请日期 1981.03.22
申请人 TEXAS INSTRUMENTS INCORPORATED 发明人 ROBBINS, JOHN;BOSTON, RICKY L.
分类号 H01L21/304;H01L21/322 主分类号 H01L21/304
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