| 摘要 |
PURPOSE:To provide a X ray reflecting mirror having high reflecting coefficient and excellent in thermal shock resistance by coating the surface of polycrystalline SiC with a monocrystalline or amorphous SiC film and grinding or polishing it to make it a mirror. CONSTITUTION:A recrystalized SiC base material 1 with pores 2 is ground by a grinder to generate the object form of free curved surfaces. On the surface of the SiC base material 1, a coating film 3 consisting of polycrystalline SiC by chemical vapor deposition is formed. After the SiC film 3 is ground with a grinder, it is polished with a polishing device to make it a mirror. On the surface of the polycrystalline SiC film 3 having the object form on the mirror, an amorphous SiC film 4 by low temp. sputtering is formed. Next, and the film 4 is ground and polished to make it a mirror. Thereby a X ray reflecting mirror is obtained a which has no intercrystalline difference of the surface level and is ultra smooth and has high reflection coefficient and excels in thermal shock resistance and does not undergo SiC film peeling even when used for a long time. |
