发明名称 HFCVD method for producing thick, adherent and coherent polycrystalline diamond films
摘要 A method for depositing a thick, adherent and coherent polycrystalline diamond (PCD) film onto a metallic substrate using a deposition rate of no greater than 0.4 mu m per hour. The resulting PCD Film has a smooth surface finish, enhanced crystal orientation in comparision to industrial grade diamond powder particularly in the (220) and (400) directions, and excellent electrical and thermal properties. The method enables one to deposit PCD films having a thickness of at least 12 microns for applications on flat as well as curved substrates having wide use in the electronics industry. Thick PCD films of this invention have been found to be ideal for dissipating heat from radio frequency (RF) and microwave (MW) devices.
申请公布号 US5186973(A) 申请公布日期 1993.02.16
申请号 US19900582439 申请日期 1990.09.13
申请人 DIAMONEX, INCORPORATED 发明人 GARG, DIWAKAR;TSAI, WILMAN;KIMOCK, FRED M.;IAMPIETRO, ROBERT L.;DYER, PAUL N.
分类号 C23C16/27 主分类号 C23C16/27
代理机构 代理人
主权项
地址