Substrate coated with a thin amorphous silicon doped carbon layer, its preparation and use.

摘要

Solid substrate coated over at least part of its surface with a thin layer consisting essentially of amorphous hard carbon to which silicon has been added; its preparation by the plasma-assisted chemical deposition method and its use especially as protective coating against chemical agents, as antiwear coating, as electrical insulation coating, as decorative coating or as heat-conductive coating.