发明名称 Method for removing contaminants by maintaining the plasma in abnormal glow state
摘要 An apparatus is disclosed for abrading contaminants from the surface of a workpiece using plasma glow discharge. The workpieces are positioned in a low pressure chamber with an ionizable gas. A pair of spaced, conductive, interfacing panels form electrodes mounted within the chamber and defining a three-dimensional cleaning space between the electrodes. The electrodes are energized by a power supply, providing an alternating voltage at an ultrasonic frequency and the pressure is maintained to allow only abnormal glow discharge. After initiation of the abnormal glow discharge the electrode current is sensed to detect when to inject additional ionizable gas into the low pressure chamber.
申请公布号 US5163458(A) 申请公布日期 1992.11.17
申请号 US19910704211 申请日期 1991.05.22
申请人 OPTEK, INC. 发明人 MONROE, MARVIN E.
分类号 A61C8/00;B08B7/00;H05H1/26 主分类号 A61C8/00
代理机构 代理人
主权项
地址