| 摘要 |
<p>PURPOSE:To improve the strength of adhesion between a wiring electrode layer and a transparent conductive film and to improve reliability by forming an oxide layer or nitride layer which is an intermediate tight adhesive layer between the wiring electrode layer and the transparent conductive layer. CONSTITUTION:The wiring electrode layer 19 of the liquid crystal display device for which a thin-film diode formed with a transparent electrode layer, a semiconductor layer 17 and the wiring electrode layer 19 are formed on a substrate 12 is used has the intermediate layer 20 consisting of the oxide layer or the nitride layer under this wiring electrode layer 19. The production process consists in forming a 2nd photoresist 18 on the semiconductor layer 17, etching the semiconductor layer 17 with this 2nd photoresist 18 as a mask, removing the 2nd photomask 18 and successively forming the intermediate layer 20 consisting of the oxide layer or nitride layer and the wiring electrode layer 19. A 3rd photoresist 21 is then formed on this wiring electrode layer and with this photoresist as a mask, the wiring electrode layer 19 and the intermediate layer 20 are etched and further, the semiconductor layer 17 is etched and the 3rd photoresist 21 is removed.</p> |
