发明名称 SEMICONDUCTOR MANUFACTURING APPARATUS
摘要 <p>PURPOSE:To present a semiconductor device that prevents a drip of a chemical from the end face of a wafer, by dispensing an encapsulating chemcial automatically onto the end face of the wafer so that a uniform face of an applied chemical is obtained. CONSTITUTION:A semiconductor manufacturing apparatus comprises an adjustment mechanism 3 for adjusting the horizontal location of a semiconductor wafer 7, a wafer chuck mechanism 8 for holding horizontally the semiconductor wafer 7, a mechanism 12 for turning the wafer chuck mechanism 8 and moving the semiconductor wafer 7 to an adequate position where the encapsulating chemical is applied, a driving mechanism 9 for turning the semiconductor device 7 through the wafer chuck mechanism 8, and a dispenser unit 33 for dispensing an encapsulating chemical to the end face of the semiconductor wafer 7, which has been turned through the driving mechanism 9, so that an encapsulating chemical is applied automatically to the end face of the semiconductor device 7.</p>
申请公布号 JPH04317312(A) 申请公布日期 1992.11.09
申请号 JP19910084221 申请日期 1991.04.16
申请人 TOSHIBA CORP 发明人 YOSHIKAWA KIYOSHI
分类号 B05D7/24;H01L21/02;H01L21/68;H01L21/683 主分类号 B05D7/24
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