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发明名称
INSULATING FILM/COMPOUND SEMICONDUCTOR LAMINATION STRUCTURE ON ELEMENT SEMICONDUCTOR SUBSTRATE
摘要
申请公布号
JPH04315419(A)
申请公布日期
1992.11.06
申请号
JP19910108793
申请日期
1991.04.12
申请人
NEC CORP
发明人
MORI KAZUO
分类号
H01L21/20;H01L21/205;H01L27/15
主分类号
H01L21/20
代理机构
代理人
主权项
地址
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