PLASMA SOURCE AND ION BEAM SOURCE USING THE SAME,申请号JP19910069989-传众专利搜索

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发明名称	PLASMA SOURCE AND ION BEAM SOURCE USING THE SAME
摘要
申请公布号	JPH04306540(A)	申请公布日期	1992.10.29
申请号	JP19910069989	申请日期	1991.04.02
申请人	HITACHI LTD	发明人	NISHIO RYOJI
分类号	B01D59/34;C23C14/30;C23C14/48;H01J27/22;H01J37/08;H01L21/265	主分类号	B01D59/34
代理机构		代理人
主权项
地址

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