| 摘要 |
PURPOSE:To provide a washer capable of executing washing treatment better than a conventional device. CONSTITUTION:Semiconductor wafers in wafer carriers 19 placed on an unloader 6 are received by a rotary carrying arm 9, carried successively to a washing treating tank 10, a washing treating tank 11 and an underwater loader 7, and washed and treated by a washing treating unit 2. The semiconductor wafers are transferred to a washing treating unit 3 by the underwater loader 7. conveyed successively to a washing treating tank 13 and a washing by a rotary carrying arm 12 treating tank 14 and an underwater loader 8, and washed and treated by the washing treating unit 3. The semiconductor wafer are transported to a washing treating unit 4 by the underwater loader 8, and conveyed to a drying treating tank 17 by a rotary carrying arm 15. The wafer forks of the rotary carrying arm 15 are inserted into a washing and drying mechanism 16 and washed and dried, and the semiconductor wafers are unloaded to an unloader 6 by the washed and dried wafer forks.
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