发明名称 POSITIVE TYPE RESIST COMPOSITION
摘要 PURPOSE:To enhance sensitivity, remaining film endurance, resolution, and dimension controllability by incorporating an alkalisoluble phenol resin and a mixture of the esters of a specified phenolic compound as a photosensitive agent. CONSTITUTION:The ester of quinonediazido-sulfonic acid and the hydroxyl group of one of the phenol compounds represented by formula I and II and the esters of its hydroxyl groups and sulfonic acid represented by formula III and/or the esters of those and carboxylic acid represented by formula IV, and the alkali-soluble phenol resin are incorporated as the photosensitive agent. In formulae I-IV, each of R<1>-R<6> is H, halogen, or the like; R<7> is H, 1-4C alkyl, or the like; each of R<8> and R<9> is H, OH, or the like; each of R<10>-R<12> is H, halogen, or the like; R<13> is H, 1-4C alkyl, or the like; R<14> is optionally substituted alkyl or such aryl; R<15> is alkyl or aryl, or the like.
申请公布号 JPH04301850(A) 申请公布日期 1992.10.26
申请号 JP19910091603 申请日期 1991.03.29
申请人 NIPPON ZEON CO LTD 发明人 KAWADA MASAJI;KASHIWAGI MIKIFUMI;KOITO KAZUKO
分类号 G03F7/022;H01L21/027;H01L21/30 主分类号 G03F7/022
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