| 摘要 |
PURPOSE:To align the positions of design data and image data automatically before the inspection of a pattern corresponding to the design data is performed. CONSTITUTION:A pattern inspecting apparatus inspect a pattern by comparing design data with the image data which are obtained by scanning the pattern that is formed on a material to be inspected at a specified magnification based on the design data. The image data corresponding to the parts of the alignment design data in the at least two arbitrary small regions which are selected beforehand are detected by pattern matching. The amount of the position deviation of the pattern is detected by the comparison of the detected image data and the design data, and the pattern is aligned. A magnification switching means 3 of an optical system for scanning the pattern is provided. The image data corresponding to the part of the alignment design data are detected at the magnification which is lower than the specified magnification. |
