ETCHING OF SILICON LAYER,申请号JP19910078317-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	ETCHING OF SILICON LAYER
摘要
申请公布号	JPH04290430(A)	申请公布日期	1992.10.15
申请号	JP19910078317	申请日期	1991.03.19
申请人	TOKYO ELECTRON LTD;TOKYO ELECTRON YAMANASHI KK	发明人	HIGUCHI FUMIHIKO;FUKAZAWA YOSHIO
分类号	H01L21/302;H01L21/3065;H01L21/3213	主分类号	H01L21/302
代理机构		代理人
主权项
地址

您可能感兴趣的专利

CASING FOR VENTILATING DEVICE

RESIN COMPOSITION FOR TONER AND TONER

PC STAIRS BUILDING METHOD AND PC STAIRS

FLUID FEED PUMP

HOT AIR DRYING DEVICE

COMPOSITE RADAR APPARATUS FOR SHIP

COLORED PICTURE FORMING MATERIAL AND FORMATION OF COLORED PICTURE

METHOD AND APPARATUS FOR INFRARED SPECTRAL ANALYSIS

MEASURING ARRANGEMENT OF AVERAGE STAYING TIME

DEVICE AND METHOD FOR PROCESSING GRAPHIC DISPLAY

METHOD OF CONTROLLING DIRECTION OF SHIELD MACHINE

BLOWED CONTROL DEVICE FOR FREEZER

RUNNING POWER TRANSMITTING DEVICE FOR VEHICLE

UNDERWATER BANKING METHOD

FOCUS DETECTION DEVICE

FUEL INJECTION CONTROLLER FOR DIESEL ENGINE

Solid-state laser device capable of generating a harmonic laser beam at a high conversion efficiency

Apparatus and process for producing vacuum blood collecting tubes

Telescopic steering lock