| 摘要 |
A cleaning system for semiconductor wafers wherein a megasonic energy cleaning system is utilized. Megasonic energy cleaning systems comprise a piezo-electric transducer and a transmitter. The transducer emits high frequency energy into the body of the transmitter. The transmitter radiates this energy into a container holding processing fluid. The energy causes the liquid to oscillate, thus vibrating contaminants off the surface of the wafer. The megasonic cleaning system is located atop a table which is mounted on a piston. In retracting the piston, the bottom of the container is removed any any liquid held within is dumped out into a second receptacle. The piston can then be returned to its extending position, and a rinsing agent can be added. Thus the megasonic cleaning system can be employed during the rinse cycle as well as the processing cycle, better cleaning the semiconductor wafer. The combination of the megasonic energy cleaning system with a dump valve provides for higher yield and superior purity in semiconductor processing. One version of the megasonic cleaning device is located in the lower part of a tank separate from the dump valve.
|
