COMPOSITION OF PHOTORESIST WHICH CAN PERFORM OPTICAL IMAGING AND ELECTRODEPOSITION

摘要

PURPOSE: To provide a photoresist for electrodeposition having excellent photosensitivity and resolution. CONSTITUTION: This photoresist composition capable of electrodepositing contains an aq. dispersion of (a) a water dispersible unsaturated cationic polymer material, (b) a nonionic unsaturated material and (c) a photoinitiator. The composition is capable of forming a thin and uniform electrodeposition film having improved photosensitivity and resolution and is effectively insolubilized by selectively patterning irradiation when the film is exposed with actinic radiation, further an unexposed part of the film is removed by a dil. acid aq. solution and the exposed part of the film is insoluble in the dil. acid aq. solution.