| 摘要 |
<p>A field effect transistor comprising a compound semiconductor substrate, a source and a drain electrodes disposed on a compound semiconductor substrate, a gate electrode disposed therebetween, and a layer for reducing the surface levels formed on the surface of the substrate at least between the gate and the drain electrodes. The field effect transistor is produced by a process comprising steps of producing a gate electrode on an active layer which is produced by ion implantation into the semiconductor substrate, producing a source and a drain region by implanting impurity into the entire surface of the substrate using the gate electrode as a mask, producing ohmic electrodes on the source and the drain regions of the substrate, producing a layer for reducing localized surface levels which exists at that region by treating the surface of the substrate at least between the gate and the drain electrodes using predetermined reactive solution or gas, and producing a protecting film on the entire surface of the wafer. Therefor, the field effect transistor having a high gate-drain breakdown voltage is obtained without reducing the yield. This FET can be applied to high output analog integrated circuit. <IMAGE></p> |
