发明名称 DEVELOPING METHOD FOR SENSITIVE MATERIAL INCLUDING DIAZO RESIN
摘要 PURPOSE:To prevent the generation of stain even when used for printing by obtaining a sensitive material in which anions of a diazo resin is specific, and developing the material in a specific condition and with a developer substantially not including an organic solvent. CONSTITUTION:A sensitive layer having a diazo resin and an alkali soluble swelling polymer compound is provided on a supporting body. And anions of the diazo resin are PF6<->, BF4<-> and an organic anion or a mixture of them. This sensitive material is developed at a pH of 8 to below 12 at 25 deg.C and with a developer substantially not including an organic solvent.
申请公布号 JPH04212963(A) 申请公布日期 1992.08.04
申请号 JP19900405314 申请日期 1990.12.06
申请人 FUJI PHOTO FILM CO LTD 发明人 KOIKE AKINOBU;KITA NOBUYUKI
分类号 G03F7/00;G03F7/021;G03F7/32 主分类号 G03F7/00
代理机构 代理人
主权项
地址