发明名称 |
DEVELOPING METHOD FOR SENSITIVE MATERIAL INCLUDING DIAZO RESIN |
摘要 |
PURPOSE:To prevent the generation of stain even when used for printing by obtaining a sensitive material in which anions of a diazo resin is specific, and developing the material in a specific condition and with a developer substantially not including an organic solvent. CONSTITUTION:A sensitive layer having a diazo resin and an alkali soluble swelling polymer compound is provided on a supporting body. And anions of the diazo resin are PF6<->, BF4<-> and an organic anion or a mixture of them. This sensitive material is developed at a pH of 8 to below 12 at 25 deg.C and with a developer substantially not including an organic solvent. |
申请公布号 |
JPH04212963(A) |
申请公布日期 |
1992.08.04 |
申请号 |
JP19900405314 |
申请日期 |
1990.12.06 |
申请人 |
FUJI PHOTO FILM CO LTD |
发明人 |
KOIKE AKINOBU;KITA NOBUYUKI |
分类号 |
G03F7/00;G03F7/021;G03F7/32 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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