| 摘要 |
<p>PURPOSE:To make it possible to accurately form a specified pattern on a sample substrate by a method wherein a light absorber, which has the same pattern shape as that of a light-shielding pattern and absorbs light emitted from a light source, is formed on a plane facing the sample substrate for a photo-mask. CONSTITUTION:A light aborber 3, which has the same pattern shape as that of the light-shielding pattern 2 and absorbs light emitted from a light source, is formed on a plane facing the sample substrate 5 for a photo-mask 4. Therefore, the light reflected by the sample substrate 5 is absorbed by the light absorber 3 and does not return to the sample substrate 5 again, and the pattern shape of the light absorber 3 is the same as that of the light-shielding pattern 2, with the result that the light emitted on the sample substrate 5 will not absorbed by the absorber 3 purposelessly. Thus, only the specified part on the sample substrate 5 is irradiated, thereby making it possible to accurately form a specified pattern on the sample substrate 5.</p> |
