X-RAY GENERATION SYSTEM FOR AN ULTRA FINE LITHOGRAPHY AND A METHOD THEREFOR

摘要

The X-ray generation system for an ultra fine lithography includes a center electrode having an adjusting member, a peripheral electrode having gas flow holes and a metal disc having gas flow holes for generating the X-ray from a plasma. A large capacitor, a transparent cylinder, a discharge member, discharge and observing windows, a cylindrical insulator, exhaust holes, a metal container, large electric power spatial gap switches, a current returning wire are also provided. An exhaust pump, and gas feeding members continuously operate increasing stability, controlling, and discharging the quentity.