| 摘要 |
PURPOSE:To manufacture an optical wave-guiding channel having a high refraction factor area as a wave guide for light by conducting one or more ion implantation on a substrate to form a high refraction factor layer. CONSTITUTION:Masking is applied to a Y3Fe5O12 substrate 10 by a mask 12 with a stripe form 11 left. The implantation of an ion 13 is conducted several times to form an ion implantation area 24, and the mask 12 is removed. The area forms an area having a high refraction factor in the center part to the refraction factor of the substrate 10. The substrate 10 is cut vertically to the form 11, and an optical polishing is conducted to form incident and outgoing ends 25, 26. The resulting high refraction factor layer is used as a wave guide for light. |
