| 摘要 |
PURPOSE:To prevent multiple exposure by checking the overlap of a definition frame. CONSTITUTION:The overlap of the definition frame 1 is checked. Design data for mask pattern formation is inputted to an electronic computer first. Then the definition frame 1 is judged as a pattern and it is judged whether the definition frame 1 has an overlap or not. When the definition frame has no overlap, the exposure data for mask pattern formation is obtained by normal processes of sizing, shifting, a mirror, reduction, etc. Thus the overlap of the definition frame 1 is checked to generate the exposure data for mask pattern formation which is free from the overlap of the definition frame, so multiple exposure due to the overlap of the definition frame can be evaded. |
