摘要 |
<p>A method of gas phase synthesis comprises the steps of measuring, by ellipsometry, optical properties of a surface of a sample (m) on which a film is formed during formation of the film, and of evaluating a density of nucleation from changes in ellipsometric parameter angles during formation of the film. An apparatus for gas phase synthesis comprises a synthesizing chamber (2), a light source means (15) which is disposed outside the synthesizing chamber (2) for radiating polarized light into the synthesizing chamber (2), a light-inlet window (14) mounted on the synthesizing chamber (2) for introducing thereinto the light radiated from the light source means (15), a light-outlet window (17) mounted on the synthesizing chamber (2) for leading the light introduced from the light-inlet window (14) and reflected from a substrate (m) on which a film is being formed out of the synthesizing chamber (2), a light-receiving means (18) for receiving the light reflected from the substrate (m) and passed through the light-outlet window (17), and a data processing system (19) for receiving an output signal from the light-receiving means (18) for measuring and analyzing a density of nucleation. <IMAGE></p> |