发明名称 ORGANIC SILICON COMPOUND AND COSMETIC
摘要 PURPOSE:To obtain the subject compound having benzotriazole skeleton or benzophenone skeleton giving excellent using feeling in a case of mixing in cosmetic, etc., having excellent ultraviolet rays-absorbing property and film- forming property, etc., comprising specific constituting units in a specific ratio. CONSTITUTION:The aimed compound contains R SiO1/2 unit and SiO2 unit as essential constituting units, and further contains R<2>SiO3/2 unit and R SiO unit in respective amounts of 0-20mol% of the total. Said units exist in a molar ratio expressed by formula I and 1-33mol% of organic groups expressed by R<1> to R<3> are selected from the groups expressed by formula II, formula III, formula IV or formula V (R<4> is H or 1-5C saturated hydrocarbon; R<5> is 1-8C monofunctional organic group, halogen or alkoxy, etc.; R<6> is H or 1-10C monofunctional hydrocarbon; a is 0-3, b is 0-4 and c is 0-5), etc., then remaining is composed of 1-18C monofunctional. organic group. Besides, said compound is contained in the aimed cosmetic.
申请公布号 JPH04132736(A) 申请公布日期 1992.05.07
申请号 JP19900254971 申请日期 1990.09.25
申请人 SHIN ETSU CHEM CO LTD 发明人 SAKUTA KOJI;KUWATA SATOSHI
分类号 C08G77/00;A61K8/00;A61K8/55;A61K8/58;A61K8/89;A61K8/893;A61K8/898;A61Q1/00;A61Q1/04;A61Q1/06;A61Q1/10;A61Q1/12;A61Q17/04;C07F7/02;C07F7/08;C07F7/10;C07F7/18;C08G77/02;C08G77/06;C08G77/14;C08G77/16;C08G77/18;C08G77/22;C08G77/26;C08G77/28;C08L83/06;C08L83/12;C09K3/00 主分类号 C08G77/00
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