| 摘要 |
PURPOSE:To allow lithography of a high resolving power to be executed by short-time exposing by using a specific compd. as a crosslinking agent. CONSTITUTION:The compd. expressed by formula I and/or formula II is used as the crosslinking agent. In the formula I, R<1> denotes an alkyl group; A denotes an alkyl group which may be substd., alkenyl group, aryl group or 5- to 6-membered arom. heterocyclic group; B denotes a hydrogen atom or -CH2OR<2>; R<2> denotes an alkyl group. In the formula II, X denotes a bivalent org. group; D<1> to D<4> respectively independently denote a hydrogen atom or -CH2OR<3>; R denotes an alkyl group; (n) denotes 0 or 1; at least two of D<1> to D<4> are not the hydrogen atoms. The lithography of the high revolving power is executed by the short-time exposure in this way by using the light of the wavelength of a deep UV region. |
