| 摘要 |
PURPOSE:To obtain a highly reliable liquid crystal display having superior display quality and to shorten the process by forming an interference film which selects the wavelength of transmitting light on the top and/or reverse of a pixel electrode. CONSTITUTION:A conductive thin film of Al, Ta, Ti, etc., is formed as a lower conductor 5, connected to a bus line, on a transparent insulating substrate 1 of glass, plastic, etc., by sputtering, vapor deposition, etc., to several hundreds several thousands of Angstrom thickness, and the film is etched into a specific pattern. Then a hard carbon film of Al2O3, SiOX, SiNX, SiCX, etc., is formed as an insulting layer 2' by a sputtering, plasma CVD, or ion beam method, etc., to several 100 - several thousands of Angstrom . This film serves as an interference film. Then the conductive thin film of Pt, Ni, Ag, etc., as an upper conductor 6 is formed to several hundreds - several thousands of Angstrom thickness and etched into a specific pattern. Finally, a transparent conductive thin film of ITO, ZnO, Al, etc., as the pixel electrode 3 is formed of extremely thin film metal by vapor deposition, etc., to several hundreds - several thousands or less than several hundreds of Angstrom thickness and etched into a specific pattern. |
