| 摘要 |
PURPOSE:To make it possible to detect the defect of a pattern in distinction from a particle by a method wherein the form of the pattern formed on the surface of an object to be inspected is optically inspected by a transmitted light or reflected light and at the same time, a foreign substance existing on the surface of the object to be inspected is inspected by scattered light. CONSTITUTION:First and second photodetectors 7 and 8 are used as ones for detecting the same position of adjacent patterns on a reticle 1 and a third photodetector 11 detects a particle on a pattern considerably apart from these patterns. In a defect judgment circuit 17, the comparison of a defect with a particle is executed in respect to each pattern and when both of the defect and the particle are detected at the same position as shown at a point 01, it is judged that there is not the defect, while in the case the defect only is detected and the particle is not detected as shown at a point 02, it is judged that a true defect exists at said position of the pattern. Thereby, the particle can be detected without being affected by the defect of the surface of an object to be inspected. |
