CHEMICAL-MECHANICAL POLISHING PLANARIZATION MONITOR METHOD AND DEVICE,申请号JP19970066598-传众专利搜索

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发明名称	CHEMICAL-MECHANICAL POLISHING PLANARIZATION MONITOR METHOD AND DEVICE
摘要
申请公布号	JPH10144636(A)	申请公布日期	1998.05.29
申请号	JP19970066598	申请日期	1997.03.19
申请人	IND TECHNOL RES INST	发明人	CHIN RAIJO
分类号	B24B1/00;H01L21/304;(IPC1-7):H01L21/304	主分类号	B24B1/00
代理机构		代理人
主权项
地址

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