发明名称 PRODUCTION OF ANTIREFLECTION MOLDING
摘要 PURPOSE:To obtain the molding having excellent scratching resistance and antireflection function by polymerizing at least one kind of multifunctional monomers having >=2 pieces of (meth) acryloyloxy groups in one molecule to form a cured thin film, bringing a film having fine rugged parts into tight contact with the thin film, immersing the films in water and irradiating the films with UV rays including <=300nm wavelength, then removing the film and treating the cured thin film under an alkaline condition. CONSTITUTION:The example of the multifuncitonal monomers having >=2 pieces of the (meth) acryloyloxy groups in one molecule is ethylene glycol diacrylate and is the material having >=50% the UV transmittance in <=300nm wavelength region. Fine recessed parts or projecting parts which are irregularly distributed are formed on one of both surface of such substrate. The film which is so formed as to have the difference in the height of the recessed parts and the projecting parts larger than the wavelengths of the UV rays for irradiation and satisfies the conditions of >=6X10<2> pieces/cm<2> and <=6X10<8> pieces/cm<2> in the densities of the recessed parts and the projecting parts is brought into tight contact with the thin films and the films are immersed into the water. After the films are irradiated with a high-pressure mercury lamp, the film is removed and the cured layer (cured thin film) is immersed into an aq. soln. of sodium hydroxide, by which the molding is completed.
申请公布号 JPH0430101(A) 申请公布日期 1992.02.03
申请号 JP19900135491 申请日期 1990.05.28
申请人 MITSUBISHI RAYON CO LTD 发明人 UENISHI MICHIHARU;TAKEI MASATOSHI;MORITA MITSUHARU
分类号 G02B1/11;G02B1/10 主分类号 G02B1/11
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