发明名称 MATERIAL RETAINING MECHANISM
摘要 <p>PURPOSE:To excellently maintain the flatness of the surface to be treated and to make it possible to maintain the surface to be treated vertical to the axis of ion beam without exposing the molecular beam epitaxially (MBE) treated material to the atmospheric air. CONSTITUTION:A holder 10, with which an MBE-treated material 12 will be retained in a groove 14, is housed in a cassette, and the cassette is set in a holder-replacing chamber. The above-mentioned holder 10 is superposed on a holder 6 using the pin 19 of an ion beam treatment holder 6, having ridge surface 18, as the guide of the heated part of the holder 10. As a result, the MBE treatment holder, on which the MBE-treated material is set, can be set in vacuum on the ion beam treatment holder, and also the edge part of the material can be firmly fixed by the ridge surface, which is manufactured in a highly precise manner, on the plane surface vertical to the optical axis provided on the groove surface, formed on the above-mentioned MBE treatment holder, and the ion beam treatment holder.</p>
申请公布号 JPH0430419(A) 申请公布日期 1992.02.03
申请号 JP19900136470 申请日期 1990.05.25
申请人 JEOL LTD 发明人 TAMAI MAKOTO
分类号 H01L21/683;H01L21/203;H01L21/265;H01L21/68 主分类号 H01L21/683
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