发明名称 VERIFICATION OF REFERENCE DIMENSION OF MASK PATTERN
摘要 PURPOSE:To make discrimination of a quasi-error from a verified error unnecessary and to obviate omission of verification of an error to be originally verified by subtracting already verified error data from error data in which reference dimensions have been checked with original data. CONSTITUTION:In a process for verifying whether dimensions of graphics of a mask pattern are reference dimensions or larger or not, a replacing step of registered data having three steps of registering error data generated in designed oil mask pattern, input of necessary data, collating with common sell error data, and forming a mask pattern formed of error data, and a subtracting step of confirmed error from confirmed result of an original having three steps of widening mask pattern data formed of error data, widening error data in which reference dimensions of the original data are checked, and performing logical calculation are provided.
申请公布号 JPH046851(A) 申请公布日期 1992.01.10
申请号 JP19900108362 申请日期 1990.04.24
申请人 NEC IC MICROCOMPUT SYST LTD 发明人 ENDO YOSHINORI
分类号 G01B11/24;G03F1/84;H01L21/027;H01L21/82 主分类号 G01B11/24
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