VERFAHREN ZUR HERSTELLUNG EINER MAGNETISCHEN SCHICHT UND IHRE ANWENDUNG BEI DER HERSTELLUNG EINES MAGNETKOPFES.
摘要
Ion implantation is conducted in a desired area(s) of the surface of a magnetic layer, and annealing of the layer is carried out to control the composition in that desired area(s). The control of the composition may be facilitated by applying a one-directional or rotating magnetic field during ion implantation. In preparing a magnetic head, a portion of a magnetic pole at least on one side thereof in close proximity to a magnetic recording medium is formed into an iron or iron-based magnetic alloy film, at least part of which is subjected to ion implantation and annealing.
申请公布号
DE3584747(D1)
申请公布日期
1992.01.09
申请号
DE19853584747
申请日期
1985.08.23
申请人
HITACHI, LTD., TOKIO/TOKYO, JP
发明人
OTOMO, SHIGEKAZU, SAYAMA-SHI SAITAMA-KEN, JP;KUMASAKA, NORIYUKI, OME-SHI TOKYO, JP;IMURA, RYO;SUGITA, YUTAKA, TOKOROZAWA-SHI SAITAMA-KEN, JP;SUZUKI, RYO, HACHIOJI-SHI TOKYO, JP