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发明名称
METHOD OF ETCHING SILICON MATERIAL LAYER
摘要
申请公布号
JPH043929(A)
申请公布日期
1992.01.08
申请号
JP19900104745
申请日期
1990.04.20
申请人
SONY CORP
发明人
SHINOHARA KEIJI
分类号
H01L21/302;H01L21/3065;(IPC1-7):H01L21/302
主分类号
H01L21/302
代理机构
代理人
主权项
地址
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