发明名称 Metal-insulator-metal stack and method for manufacturing the same
摘要 A method for manufacturing a metal-insulator-metal (MIM) stack is described. The method includes forming a temporary stack by depositing a bottom electrode comprising at least one metal layer; depositing a dielectric comprising at least one layer of a dielectric material having a first dielectric constant value; and depositing a top electrode comprising at least one metal layer. The step of depositing the bottom and/or top electrode includes depositing a non-conductive metal oxide layer directly in contact with the dielectric; and after the step of depositing the bottom and/or top electrode's non-conductive metal oxide layer and the dielectric, subjecting the temporary stack to a stimulus, which transforms the non-conductive metal oxide into a thermodynamically stable oxide having conductive properties or into a metal, and the dielectric material into a crystalline form having a second dielectric constant value higher than the first dielectric constant value, thereby creating the final MIM stack.
申请公布号 US9431474(B2) 申请公布日期 2016.08.30
申请号 US201213705512 申请日期 2012.12.05
申请人 IMEC 发明人 Popovici Mihaela Ioana
分类号 B05D5/12;H01L49/02;H01G4/008;H01L21/3205;B05D7/00;H01L21/02 主分类号 B05D5/12
代理机构 McDonnell Boehnen Hulbert & Berghoff LLP 代理人 McDonnell Boehnen Hulbert & Berghoff LLP
主权项 1. A method for manufacturing a metal-insulator-metal (MIM) stack, comprising: forming a temporary stack by: depositing a bottom electrode comprising at least one metal layer;depositing a dielectric comprising at least one layer of a dielectric material having a first dielectric constant value; anddepositing a top electrode comprising at least one metal layer;wherein depositing at least one of the bottom electrode or the top electrode includes depositing a non-conductive metal oxide layer directly in contact with the dielectric, wherein the non-conductive metal oxide is in a metastable and high oxidation state; and after depositing the non-conductive metal oxide layer and the dielectric, subjecting the temporary stack to a stimulus to cause the non-conductive metal oxide layer to release oxygen and transform into a thermodynamically stable oxide having conductive properties or into a metal, and to cause the dielectric to incorporate the released oxygen and transform into a crystalline form having a second dielectric constant value higher than the first dielectric constant value.
地址 Leuven BE