发明名称 |
Metal-insulator-metal stack and method for manufacturing the same |
摘要 |
A method for manufacturing a metal-insulator-metal (MIM) stack is described. The method includes forming a temporary stack by depositing a bottom electrode comprising at least one metal layer; depositing a dielectric comprising at least one layer of a dielectric material having a first dielectric constant value; and depositing a top electrode comprising at least one metal layer. The step of depositing the bottom and/or top electrode includes depositing a non-conductive metal oxide layer directly in contact with the dielectric; and after the step of depositing the bottom and/or top electrode's non-conductive metal oxide layer and the dielectric, subjecting the temporary stack to a stimulus, which transforms the non-conductive metal oxide into a thermodynamically stable oxide having conductive properties or into a metal, and the dielectric material into a crystalline form having a second dielectric constant value higher than the first dielectric constant value, thereby creating the final MIM stack. |
申请公布号 |
US9431474(B2) |
申请公布日期 |
2016.08.30 |
申请号 |
US201213705512 |
申请日期 |
2012.12.05 |
申请人 |
IMEC |
发明人 |
Popovici Mihaela Ioana |
分类号 |
B05D5/12;H01L49/02;H01G4/008;H01L21/3205;B05D7/00;H01L21/02 |
主分类号 |
B05D5/12 |
代理机构 |
McDonnell Boehnen Hulbert & Berghoff LLP |
代理人 |
McDonnell Boehnen Hulbert & Berghoff LLP |
主权项 |
1. A method for manufacturing a metal-insulator-metal (MIM) stack, comprising:
forming a temporary stack by:
depositing a bottom electrode comprising at least one metal layer;depositing a dielectric comprising at least one layer of a dielectric material having a first dielectric constant value; anddepositing a top electrode comprising at least one metal layer;wherein depositing at least one of the bottom electrode or the top electrode includes depositing a non-conductive metal oxide layer directly in contact with the dielectric, wherein the non-conductive metal oxide is in a metastable and high oxidation state; and after depositing the non-conductive metal oxide layer and the dielectric, subjecting the temporary stack to a stimulus to cause the non-conductive metal oxide layer to release oxygen and transform into a thermodynamically stable oxide having conductive properties or into a metal, and to cause the dielectric to incorporate the released oxygen and transform into a crystalline form having a second dielectric constant value higher than the first dielectric constant value. |
地址 |
Leuven BE |