| 摘要 |
<p>PURPOSE:To provide a clean machined surface through removal of a residue, e.g. a reactant, abrasive grains, on a material surface by feeding the abrasive grains in a state that the abrasive grains are suspended in an acid or alkaline solution. CONSTITUTION:A reactant is produced at a contact point between a material and abrasive grains by using the abrasive grains having hardness lower than that of the material. In this case, the abrasive grains are fed in a state to be suspended in an acid or alkaline solution to effect polishing. This method prevents residence of a reactant on a material surface.</p> |
