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发明名称
METHOD FOR CONTROLLING CLEANING CONDITION OF SILICON WAFER
摘要
申请公布号
JPH03276722(A)
申请公布日期
1991.12.06
申请号
JP19900077400
申请日期
1990.03.27
申请人
MITSUBISHI MATERIALS CORP;JAPAN SILICON CO LTD
发明人
MORITA ETSURO;KISHIMOTO MIKIO;TATSUTA JIRO;SHIMANUKI YASUSHI;TANAKA TOSHIRO;WAKIZAWA YOSHIHIRO
分类号
H01L21/304
主分类号
H01L21/304
代理机构
代理人
主权项
地址
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