| 摘要 |
PURPOSE:To form a picture like metal evaporation film pattern having excellent adhesion strength between the transferred object and the metal evaporation layer only by a dry process by utilizing the electron beam hardenable adhesive layer to adhere the metal evaporation film layer to the transferred object. CONSTITUTION:The transferring sheet is formed by laying the releasing agent layer 2 and the metal evaporation layer 3 on the substrate sheet 1. Meanwhile the transfer object is formed by shaping the picture like pattern of the electron beam hardening inhibiting layer M1, M2 on the transferred surface 6 of the transferred object 5. The metal evaporation layer 3 of the transferring sheet and the transferred surface 6 of the transferred object are formed to the laminate 9, being contacted through the electron beam hardenable adhesive layer 8. The laminate 9 is irradiated with the electron beam and the adhesive layer 8 is hardened. Then the substrate sheet 1, the unhardened adhesive layer 8 on the transferred surface 6, the metal evaporation layer 3 and the releasing agent layer 2 situated on it, are removed. By this, the picture like metal evaporation film pattern M of which the hardened layer 10, the metal evaporation layer 3, the release agent layer 2 are laminated on the transferred surface 6 of the transferred object 5 can be obtained. |
