| 摘要 |
PURPOSE:To make improvement in contamination preventiveness, wear resistance and salt water resistance while maintaining antireflective performance by forming a layer formed by hydrolyzing and cocondensing a compsn. consisting of a silicon alkoxide and specific silane compd. on at least the surface of the outermost layer of antireflection layers or the outer side of the antireflection layers. CONSTITUTION:The layers up to the layer adjacent to the outermost layer of the antireflection layers are formed by a PVD method and at least the side of the outermost layer where the layer comes into contact with the atm. air is formed by applying the silicon alkoxide mixture which contains the silicon alkoxide and the silane compd. expressed by formula I and is added with water and acid onto the antireflection layers and hydrolyzing and cocondensing the coating. The contact angle with the water is specified to >=60 deg.. In the formula I, R<1>, R<2> respectively independently denote a vinyl group, amino group, etc.; R<3> denotes 1 to 4C hydrocarbon group; m and n are 0, 1 or 2 and m+n satisfies 1 or 2. The antireflection film having the excellent adhesive property of the antireflection film to the substrate, contamination resistance and wear resistance is formed. |
