| 摘要 |
<p>PURPOSE:To produce a color filter having improved color reproducibility and heat resistance by incorporating at least one kind of high b.p. solvent into a layer of a silver halide photosensitive material laminated on a light transmissive substrate by 0.1-20mg/dm<2>. CONSTITUTION:A photomask 14 is set above a silver halide photosensitive material 13 having a dye-contg. emulsion layer 12 laminated on a light transmissive substrate 11, parts 16 of the emulsion layer 12 corresponding to the openings 15 in the mask 14 are selectively exposed by irradiation with light from the top of the mask 14 and a color image corresponding to a pattern is formed by coupler-in-developer type color development to produce a color filter. At this time, at least one kind of high b.p. solvent is incorporated into the photosensitive material layer or a coupler-in-developer typer developer. The solvent may be used in both the material layer and the developer but is preferably used in the material layer. When the solvent is used in the material layer, 0.1-20mg/dm<2> is required but the pref. amt. is 0.5-10 mg/dm<2>. When the solvent is used in the developer, the pref. amt. is 0.1-30g/l. The heat resistance and color reproducibility of the resulting color are improved.</p> |
