MANUFACTURE OF PHOTOVOLTAIC DEVICE

摘要

PURPOSE:To form an amorphous silicon film hardly released within a short deposition time by a method wherein an amorphous silicon dioxide film is laid between a transparent insulating substrate and the amorphous silicon film. CONSTITUTION:An amorphous silicon dioxide film 5 is formed on a transparent insulating substrate 1. Next, one or more transparent electrodes 2 are formed on the film 5. Later, an amorphous silicon film 3 is formed on the transparent electrodes 2 so as to make a part of the film 3 reach the amorphous silicon dioxide film 5. Finally, the title photovoltaic device can be manufactured by forming one or more metallic electrodes 4 if necessary.