| 摘要 |
PURPOSE:To correct a deviation angle properly even when the deviation angle is generated, and to enable pattern transfer having high accuracy by computing an angle formed by the normal direction of a step moving surface and the incident direction of SOR light and storing distances among each exposure position on a wafer after the correction of the angle and an X-ray mask corresponding to the positions in a controller. CONSTITUTION:An angle beta formed by the normal direction Z of the step moving surface of an exposure device 2 and the incident direction A of SOR light 3 is computed, distances among each exposure position on a wafer 5 after the correction of the angle beta and an X-ray mask 4 corresponding to the positions are stored in a controller, and the wafer 5 and the X-ray mask 4 are faced each other. The relative positioning and proximity gap of the wafer 5 and the X-ray mask 4 are adjusted, and the inclination of the wafer 5 and the X-ray mask 4 is corrected only by said angle beta while the distances among each exposure position on said wafer 5 and the X-ray mask 4 corresponding to the positions are corrected only by the quantities of correction previously computed at every exposure position on the basis of said angle beta. The X-ray mask 4 and the wafer 5 are irradiated with SOR light 3, and the X-ray mask 4 and the wafer 5 are exposed. |
