| 摘要 |
PURPOSE:To make analysis with high resolution both in the crosswise and depth directions of a specimen surface and with excellent quantitative determinating performance by converging an ion beam on the specimen surface with a specified acceleration voltage, furnishing a mass spectrometric means and X-ray spectrometric means confronting the ion beam irradiation point on the specimen surface, and also providing a sensing means to sense the secondary electrons emitted by the specimen. CONSTITUTION:An ion beam is converged on a specimen surface with an acceleration voltage under 100kV, and an X-ray spectrometric means 4 and mass spectrometric means 5 are arranged so as to confront the ion beam irradiation point on the specimen surface, and bedside them a secondary electron sensing means 6 is installed. In the case of ion irradiation, the ion diffusion region W is shallower than in the case of electron irradiation, which is the X-ray generating region, and also is the secondary electron generating range. Accordingly there is little information about the inside of the specimen, so that information of the pure surface configuration of specimen will be obtained. For X-rays, on the other hand, the X-ray generating region does not substantially widen greater in the direction extending along the specimen surface than the dia. of ion beam. This enables obtainment of high locational resolution both in the parallel direction to the specimen surface and in the depth direction, and provides possibility of analysis with excellent quantitative determinating performance which has not been achieved according to SIMS. |
