发明名称 PROJECTING EXPOSURE METHOD
摘要 <p>PURPOSE:To simply and easily add an ID code even when a projecting exposure is repeatedly conducted by using a reticle and a stepper by selectively covering the code with an ID code.mask corresponding to the movement of the stepper. CONSTITUTION:An ID code.mask 6 can be arbitrarily moved in X and Y directions upon movement of a reticle 1, is finely moved separately from the movement of the reticle 1 with respect to the X direction, i.e., the arranging direction of bars for forming an ID code 5 to cover predetermined bars. The number of bard for passing the light is suitably selected to display row and column where a chip exists. Thus, even when a projecting exposure is repeatedly conducted by using the reticle 1 and a stepper, the code 5 can simply and easily be added.</p>
申请公布号 JPH03150834(A) 申请公布日期 1991.06.27
申请号 JP19890288623 申请日期 1989.11.08
申请人 FUJITSU LTD 发明人 KAWAMURA EIICHI
分类号 G03F1/38;G03F7/20;H01L21/027;H01L21/30 主分类号 G03F1/38
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