| 摘要 |
<p>A second harmonic wave generating device having a thin film waveguide layer formed on a substrate, wherein the thin film wave guide layer is formed by dry etching a thin film formed on the substrate to adjust the thickness of the thin film so as to satisfy the following Equation (A) or (B): <MATH> wherein, T mu m: a thickness of the thin film waveguide layer lambda mu m: a fundamental laser wavelength noS1: an ordinary refractive index of the substrate at the fundamental wavelength ( lambda mu m) noF1: an ordinary refractive index of the thin film waveguide layer at the fundamental wavelength ( lambda mu m) neS2: an extraordinary refractive index of the substrate at a second harmonic wavelength ( lambda mu m/2) neF2 an extraordinary refractive index of the thin film waveguide layer at the second harmonic wavelength ( lambda mu m/2) N1 in Equation (A) is <MATH> and N2 in Equation (B) is <MATH> r</p> |
