发明名称 |
PROCESS FOR PRODUCING THIN-FILM OXIDE SUPERCONDUCTOR. |
摘要 |
<p>A thin-film oxide superconductor is produced by irradiating a target (2) of an oxide superconductor with a laser beam (5) to evaporate the irradiate part, and depositing the evaporated substance (4) on a base (3) to form a thin film while feeding excited oxygen to or near the thin-film formed on the base (3). Thus oxygen atoms are incorporated in the crystal structure of the thin-film to form a thin-film oxide superconductor.</p> |
申请公布号 |
EP0431160(A1) |
申请公布日期 |
1991.06.12 |
申请号 |
EP19890903216 |
申请日期 |
1989.03.15 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
NODA, ETSUO;SUZUKI, SETSUO 22-3-2-203, YAYOIDAI IZUMI-KU;MORIMIYA, OSAMI;HAYASHI, KAZUO |
分类号 |
C23C14/00;C23C14/08;C23C16/40;H01L39/24 |
主分类号 |
C23C14/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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