发明名称 PROCESS FOR PRODUCING THIN-FILM OXIDE SUPERCONDUCTOR.
摘要 <p>A thin-film oxide superconductor is produced by irradiating a target (2) of an oxide superconductor with a laser beam (5) to evaporate the irradiate part, and depositing the evaporated substance (4) on a base (3) to form a thin film while feeding excited oxygen to or near the thin-film formed on the base (3). Thus oxygen atoms are incorporated in the crystal structure of the thin-film to form a thin-film oxide superconductor.</p>
申请公布号 EP0431160(A1) 申请公布日期 1991.06.12
申请号 EP19890903216 申请日期 1989.03.15
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 NODA, ETSUO;SUZUKI, SETSUO 22-3-2-203, YAYOIDAI IZUMI-KU;MORIMIYA, OSAMI;HAYASHI, KAZUO
分类号 C23C14/00;C23C14/08;C23C16/40;H01L39/24 主分类号 C23C14/00
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