| 摘要 |
PURPOSE: To enable development using an aqueous developing solution and to improve the ink receptivity of an obtained image by covering a substrate with a specified radiation sensitive composition and modifying its surface with a specified functional group. CONSTITUTION: The surface of the substrate is covered with the radiation sensitive composition comprising a silane compound, a component having a functional group reactive with a silane compound and a component having a solubilizing group in an aqueous solution. The free surface of this composition is modified by reaction with the functional group of the general formula: Rn -S1 -X4-n in which R is an H atom or an alkyl, alkenyl, aryl, or aralkyl group and (n) is 1-3. The silane compound has at least one alkyl group and, preferably, at least one 1-20 C chain. The solubilizing group is a sulfonate, carboxylic acid group or a carbamido-sulfuric acid group. The radiation sensitive composition contains a component having a solubilizing group, such as sulfonate or diazo group, and it is developed with an aqueous developing solution. |
