| 摘要 |
PURPOSE:To produce a grain-oriented silicon steel sheet with low iron loss at a low treatment cost by carrying out the fractionization of the width of magnetic domain of a grain-oriented silicon steel sheet hy means of the formation of fine grooves alone, without recourse to the application of strain. CONSTITUTION:Etching is applied to the surface of a grain-oriented silicon steel sheet after final finish annealing or a grain-oriented silicon steel sheet with low core loss consisting of tertiary recrystallized grains of >= about 10mm by using an etchant consisting of ethyl alcohol, nitric acid, etc., by which fine grooves where space between grooves, groove width, and groove depth are regulated to 2-10mm, 20-30mu, and 3-4mu, respectively, are formed into linear or dashed-line state in a direction having an angle of 45-90 deg. with respect to the rolling direction. Subsequently, an insulation coating solution, such as phosphate and chromate, is applied to the above steel sheet and baked at >= about 350 deg.C, by which an insulation coating is formed. By this method, the grain-oriented silicon steel sheet free from deterioration in characteristics even if subjected to stress relief annealing and reduced in iron loss can be obtained. |
