ELECTRODE FOR PLASMA ETCHING AND ITS PRODUCTION,申请号JP19890223790-传众专利搜索

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发明名称	ELECTRODE FOR PLASMA ETCHING AND ITS PRODUCTION
摘要
申请公布号	JPH0387389(A)	申请公布日期	1991.04.12
申请号	JP19890223790	申请日期	1989.08.30
申请人	IBIDEN CO LTD	发明人	HORIO TAISHIN
分类号	C23F4/00;H01L21/302;H01L21/3065	主分类号	C23F4/00
代理机构		代理人
主权项
地址

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